Helicon plasma sputtering system for fabrication of multilayer x-ray mirrors

Masaki Koike*, Mitsukuni Chiwaki, Isao H. Suzuki, Naoto Kobayashi, Naoto Kobayashi

*この研究の対応する著者

研究成果査読

20 被引用数 (Scopus)

抄録

The development of multilayers on plane substrates and assessment of multilayers were presented. For the fabrication of multilayer x-ray mirrors, a sputtering system using two helicon plasma cathodes was developed. The system can deposit multilayers under Ar pressure of 1.8 × 10-4 Torr. Thin layers constructed with the system were investigated employing Rutherford Backscattering and x-ray fluorescence analysis methods. W/C multilayers whose 2d spacings between 29-63 angstrom were produced on Si substrate and exhibited reflectivity for Cr K α x rays close to the value obtained from the surface roughness.

本文言語English
ページ(範囲)2141-2143
ページ数3
ジャーナルReview of Scientific Instruments
66
2 pt 2
DOI
出版ステータスPublished - 1995 2
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(その他)
  • 器械工学

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