Helicon plasma sputtering system for fabrication of multilayer x-ray mirrors

Masaki Koike; Mitsukuni Chiwaki; Isao H. Suzuki; Naoto Kobayashi; Naoto Kobayashi

doi:10.1063/1.1146458

Helicon plasma sputtering system for fabrication of multilayer x-ray mirrors

Masaki Koike^*, Mitsukuni Chiwaki, Isao H. Suzuki, Naoto Kobayashi, Naoto Kobayashi

^*この研究の対応する著者

研究成果 › 査読

20 被引用数 (Scopus)

抄録

The development of multilayers on plane substrates and assessment of multilayers were presented. For the fabrication of multilayer x-ray mirrors, a sputtering system using two helicon plasma cathodes was developed. The system can deposit multilayers under Ar pressure of 1.8 × 10^-4 Torr. Thin layers constructed with the system were investigated employing Rutherford Backscattering and x-ray fluorescence analysis methods. W/C multilayers whose 2d spacings between 29-63 angstrom were produced on Si substrate and exhibited reflectivity for Cr K α x rays close to the value obtained from the surface roughness.

本文言語	English
ページ（範囲）	2141-2143
ページ数	3
ジャーナル	Review of Scientific Instruments
巻	66
号	2 pt 2
DOI	https://doi.org/10.1063/1.1146458
出版ステータス	Published - 1995 2
外部発表	はい

ASJC Scopus subject areas

物理学および天文学（その他）
器械工学

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10.1063/1.1146458

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title = "Helicon plasma sputtering system for fabrication of multilayer x-ray mirrors",

abstract = "The development of multilayers on plane substrates and assessment of multilayers were presented. For the fabrication of multilayer x-ray mirrors, a sputtering system using two helicon plasma cathodes was developed. The system can deposit multilayers under Ar pressure of 1.8 × 10-4 Torr. Thin layers constructed with the system were investigated employing Rutherford Backscattering and x-ray fluorescence analysis methods. W/C multilayers whose 2d spacings between 29-63 angstrom were produced on Si substrate and exhibited reflectivity for Cr K α x rays close to the value obtained from the surface roughness.",

author = "Masaki Koike and Mitsukuni Chiwaki and Suzuki, {Isao H.} and Naoto Kobayashi and Naoto Kobayashi",

year = "1995",

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doi = "10.1063/1.1146458",

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T1 - Helicon plasma sputtering system for fabrication of multilayer x-ray mirrors

AU - Koike, Masaki

AU - Chiwaki, Mitsukuni

AU - Suzuki, Isao H.

AU - Kobayashi, Naoto

PY - 1995/2

Y1 - 1995/2

N2 - The development of multilayers on plane substrates and assessment of multilayers were presented. For the fabrication of multilayer x-ray mirrors, a sputtering system using two helicon plasma cathodes was developed. The system can deposit multilayers under Ar pressure of 1.8 × 10-4 Torr. Thin layers constructed with the system were investigated employing Rutherford Backscattering and x-ray fluorescence analysis methods. W/C multilayers whose 2d spacings between 29-63 angstrom were produced on Si substrate and exhibited reflectivity for Cr K α x rays close to the value obtained from the surface roughness.

AB - The development of multilayers on plane substrates and assessment of multilayers were presented. For the fabrication of multilayer x-ray mirrors, a sputtering system using two helicon plasma cathodes was developed. The system can deposit multilayers under Ar pressure of 1.8 × 10-4 Torr. Thin layers constructed with the system were investigated employing Rutherford Backscattering and x-ray fluorescence analysis methods. W/C multilayers whose 2d spacings between 29-63 angstrom were produced on Si substrate and exhibited reflectivity for Cr K α x rays close to the value obtained from the surface roughness.

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M3 - Article

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EP - 2143

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

SN - 0034-6748

IS - 2 pt 2

ER -

Helicon plasma sputtering system for fabrication of multilayer x-ray mirrors

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