抄録
The development of multilayers on plane substrates and assessment of multilayers were presented. For the fabrication of multilayer x-ray mirrors, a sputtering system using two helicon plasma cathodes was developed. The system can deposit multilayers under Ar pressure of 1.8 × 10-4 Torr. Thin layers constructed with the system were investigated employing Rutherford Backscattering and x-ray fluorescence analysis methods. W/C multilayers whose 2d spacings between 29-63 angstrom were produced on Si substrate and exhibited reflectivity for Cr K α x rays close to the value obtained from the surface roughness.
本文言語 | English |
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ページ(範囲) | 2141-2143 |
ページ数 | 3 |
ジャーナル | Review of Scientific Instruments |
巻 | 66 |
号 | 2 pt 2 |
DOI | |
出版ステータス | Published - 1995 2月 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(その他)
- 器械工学