High-aspect ratio microfabrication of crosslinked polytetra-fluoroethylene using synchrotron radiation direct photo-etching

Takanori Katoh*, Yasunori Sato, Daichi Yamaguchi, Shigetoshi Ikeda, Yasushi Aoki, Akihiro Oshima, Masakazu Washio, Yoneho Tabata

*この研究の対応する著者

研究成果: Conference article査読

1 被引用数 (Scopus)

抄録

High-aspect ratio micro-fabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PFTE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The maximum etching rate of 150 micron/min was achieved at SR beam current of 600 mA. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of non-crosslinked PTFE. The effects of molecular motion and fragmentation of the molecules on etching process were discussed from temperature dependence on etching rate. Furthermore, we have found that surface modification of non-crosslinked PTFE had been proceeding during irradiation of SR to the surfaces at 140 °C. The modified surfaces were examined on behavior of crystallites by differential scanning calorimetry, and on chemical structure by FTIR spectroscopy and solid-state 19F NMR spectroscopy. The results showed that properties of modified layers have dependence on depth. Crosslinking reaction would be induced by SR irradiation even in its solid state within about 50 μm from the surface.

本文言語English
ページ(範囲)493-500
ページ数8
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
4979
DOI
出版ステータスPublished - 2003 8 22
イベントMicromachining and Microfarication Process Technology VIII - San Jose, CA, United States
継続期間: 2003 1 272003 1 29

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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