High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

Y. Zhang; T. Katoh; M. Washio; H. Yamada; S. Hamada

doi:10.1063/1.115533

High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

Y. Zhang^*, T. Katoh, M. Washio, H. Yamada, S. Hamada

^*この研究の対応する著者

研究成果 › 査読

100 被引用数 (Scopus)

抄録

Micromachining Teflon was achieved by direct exposure to synchrotron radiation and the microstructures made had the smallest surface detail down to 20 μm with structural height of more than 200 μm, that is, aspect ratio on the order of 10. The quality of micromachining Teflon by this process was found to be critically dependent on photon flux of the synchrotron radiation. Analysis of the mass distribution of gaseous species formed upon this process suggested that photochemical processes rather than pyrolytic processes may still dominate.

本文言語	English
ページ数	1
ジャーナル	Applied Physics Letters
巻	67
DOI	https://doi.org/10.1063/1.115533
出版ステータス	Published - 1995 12 1
外部発表	はい

ASJC Scopus subject areas

物理学および天文学（その他）

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10.1063/1.115533

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AU - Zhang, Y.

AU - Katoh, T.

AU - Washio, M.

AU - Yamada, H.

AU - Hamada, S.

PY - 1995/12/1

Y1 - 1995/12/1

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High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

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