High aspect ratio nano-scale CFX structures fabricated by deep-RIE

Takahiro Arakawa*, Hiroyuki Kusakawa, Shuichi Shoji

*この研究の対応する著者

研究成果: Conference contribution

抄録

High aspect ratio (>500) nano-scale CFx (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CFx nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CFx was controlled from 200 nm to 500 nm, and the height more than 100 μm was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.

本文言語English
ホスト出版物のタイトルProceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007
ページ287-290
ページ数4
出版ステータスPublished - 2007 12 1
イベント20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007 - Kobe, Japan
継続期間: 2007 1 212007 1 25

出版物シリーズ

名前Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN(印刷版)1084-6999

Conference

Conference20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007
国/地域Japan
CityKobe
Period07/1/2107/1/25

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 機械工学
  • 電子工学および電気工学

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