High aspect ratio nano-scale CFX structures fabricated by deep-RIE

Takahiro Arakawa, Hiroyuki Kusakawa, Shuichi Shoji

研究成果: Conference contribution

抜粋

High aspect ratio (>500) nano-scale CFx (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CFx nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CFx was controlled from 200 nm to 500 nm, and the height more than 100 μm was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.

元の言語English
ホスト出版物のタイトルProceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007
ページ287-290
ページ数4
出版物ステータスPublished - 2007 12 1
イベント20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007 - Kobe, Japan
継続期間: 2007 1 212007 1 25

出版物シリーズ

名前Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN(印刷物)1084-6999

Conference

Conference20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007
Japan
Kobe
期間07/1/2107/1/25

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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  • これを引用

    Arakawa, T., Kusakawa, H., & Shoji, S. (2007). High aspect ratio nano-scale CFX structures fabricated by deep-RIE. : Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007 (pp. 287-290). [4432970] (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)).