High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process

Takayuki Homma, Hirotaka Sato, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji

研究成果: Conference article

3 引用 (Scopus)

抜粋

Fabrication of arrays of high aspect ratio nanovolume glass (SiO 2) cells or "test tubes" by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO2 layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO2 hollow rubes.

元の言語English
ページ(範囲)705-708
ページ数4
ジャーナルProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
出版物ステータスPublished - 2004 7 19
イベント17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands
継続期間: 2004 1 252004 1 29

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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