High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process

Takayuki Homma*, Hirotaka Sato, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji

*この研究の対応する著者

研究成果: Conference article査読

3 被引用数 (Scopus)

抄録

Fabrication of arrays of high aspect ratio nanovolume glass (SiO 2) cells or "test tubes" by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO2 layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO2 hollow rubes.

本文言語English
ページ(範囲)705-708
ページ数4
ジャーナルProceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
出版ステータスPublished - 2004 7 19
イベント17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands
継続期間: 2004 1 252004 1 29

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 機械工学
  • 電子工学および電気工学

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