High electromechanical coefficient kt2=19% thick ScAlN piezoelectric films for ultrasonic transducer in low frequency of 80 MHz

Ko Hei Sano, Rei Karasawa, Takahiko Yanagitani

研究成果: Conference contribution

7 被引用数 (Scopus)

抄録

Ultrasonic transducers in the frequency ranges of 20-100 MHz is not well-developed because of less applications or less suitable piezoelectric materials. PVDF are usually used for ultrasonic transducers in the 10-50 MHz ranges. However, their electromechanical coupling coefficient kt2 of 4% is not enough for the practical uses. In order to excite ultrasonic in the 20-100 MHz, 125 μm-25 μm thick piezoelectric film is required. It is difficult to grow such a thick piezoelectric film without a crack caused by the internal stress during the PVD deposition technique. We achieved stress free film growth by employing the unique hot cathode sputtering technique without heating substrate. We demonstrated high efficient 81 MHz (kt2=18.5%) and 43 MHz (kt2=11.9%) ultrasonic generation by using the 43 μm and 90 μm extremely thick ScAlN(Sc:39%) films, respectively.

本文言語English
ホスト出版物のタイトル2017 IEEE International Ultrasonics Symposium, IUS 2017
出版社IEEE Computer Society
ISBN(電子版)9781538633830
DOI
出版ステータスPublished - 2017 10 31
イベント2017 IEEE International Ultrasonics Symposium, IUS 2017 - Washington, United States
継続期間: 2017 9 62017 9 9

出版物シリーズ

名前IEEE International Ultrasonics Symposium, IUS
ISSN(印刷版)1948-5719
ISSN(電子版)1948-5727

Other

Other2017 IEEE International Ultrasonics Symposium, IUS 2017
国/地域United States
CityWashington
Period17/9/617/9/9

ASJC Scopus subject areas

  • 音響学および超音波学

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