High hole concentrations in Mg-doped InGaN grown by MOVPE

Kazuhide Kumakura, Toshiki Makimoto, Naoki Kobayashi

研究成果: Article査読

54 被引用数 (Scopus)

抄録

We investigated the electrical properties of Mg-doped InxGa1-xN (0≤x<0.25) grown by metalorganic vapor-phase epitaxy with various growth conditions, such as Mg-doping concentration, growth-rate and growth temperature. The hole concentration depends on the growth-rate, the In mole fraction and the crystal quality of the InGaN layers. The hole concentration of Mg-doped InxGa1-xN layers below x = 0.15 increased with the In mole fraction, while those above x = 0.15 decreased. We realized the p-type InGaN with the room-temperature hole concentration above 1018 cm-3 and obtained the maximum hole concentration of 7.8×1018 cm-3 for x = 0.2 by optimizing the growth conditions.

本文言語English
ページ(範囲)267-270
ページ数4
ジャーナルJournal of Crystal Growth
221
1-4
DOI
出版ステータスPublished - 2000 12
外部発表はい

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

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