High-performance surface-channel diamond field-effect transistors

Hitoshi Umezawa, Hirotada Taniuchi, Takuya Arima, Minoru Tachiki, Hideyo Okushi, Hiroshi Kawarada

研究成果: Conference article査読

抄録

High transconductance and high channel mobility diamond field-effect transistors (FETs) utilizing self-aligned gate FET fabrication process have been operated. The 2 μm gate metal-semiconductor (MES) FET shows the high frequency operation for the first time. The obtained cut off frequency fT and maximum frequency of oscillation fmax are 2.2 and 7 GHz, respectively. It is expected that the diamond MESFET with 0.5 μm gate length fabricated by self-aligned gate process shows 8 GHz of fT and 30 GHz of fmax.

本文言語English
ページ(範囲)815-818
ページ数4
ジャーナルMaterials Science Forum
353-356
出版ステータスPublished - 2001 3 14

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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