High-temperature fabrication of Ag(In,Ga)Se2 thin films for applications in solar cells

Xianfeng Zhang*, Akira Yamada, Masakazu Kobayashi

*この研究の対応する著者

    研究成果: Article査読

    4 被引用数 (Scopus)

    抄録

    Molecular beam epitaxy was used to fabricate Ag(In,Ga)Se2 (AIGS) thin films. To improve the diffusion of Ag, high-temperature deposition and high-temperature annealing methods were applied to fabricate AIGS films. The as-grown AIGS thin films were then used to make AIGS solar cells. We found that grain size and crystallinity of AIGS films were considerably improved by increasing the deposition and annealing temperature. For high-temperature deposition, temperatures over 600 °C led to decomposition of the AIGS film, desorption of In, and deterioration of its crystallinity. The most appropriate deposition temperature was 590 °C and a solar cell with a power conversion efficiency of 4.1% was obtained. High-temperature annealing of the AIGS thin films showed improved crystallinity as annealing temperature was increased and film decomposition and In desorption were prevented. A solar cell based on this film showed the highest conversion efficiency of 6.4% when annealed at 600 °C. When the annealing temperature was further increased to 610 °C, the performance of the cell deteriorated due to loss of the out-of-plane Ga gradient.

    本文言語English
    論文番号1700042
    ジャーナルPhysica Status Solidi (A) Applications and Materials Science
    214
    10
    DOI
    出版ステータスPublished - 2017 10月 1

    ASJC Scopus subject areas

    • 電子材料、光学材料、および磁性材料
    • 凝縮系物理学
    • 表面および界面
    • 表面、皮膜および薄膜
    • 電子工学および電気工学
    • 材料化学

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