In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Hironobu Sato*, Takayuki Kakinuma, Jeung Sang Go, Shuichi Shoji

*この研究の対応する著者

研究成果: Conference article査読

61 被引用数 (Scopus)

抄録

This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.

本文言語English
ページ(範囲)87-92
ページ数6
ジャーナルSensors and Actuators, A: Physical
111
1
DOI
出版ステータスPublished - 2004 3月 1
イベントMicromechanics Section of Sensors and Actuators, based on - Kyoto, Japan
継続期間: 2003 1月 192003 1月 23

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 金属および合金
  • 電子工学および電気工学

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