In situ Ru LII and LIII edge x-ray absorption near edge structure of electrodeposited ruthenium dioxide films

Ionel C. Stefan, Yibo Mo, Mark R. Antonio, Daniel Alberto Scherson*

*この研究の対応する著者

研究成果: Article査読

22 被引用数 (Scopus)

抄録

The electronic properties of electrodeposited Ru oxide films supported on Au have been examined in situ by Ru LIII and LII edge X-ray absorption near edge structure (XANES) in acid media. The results obtained are consistent with the main voltammetric peak centered at 0.7 V vs RHE as being attributed to a redox couple involving formally Ru3+ and Ru4+ sites in the lattice. A linear correlation was found between the extent of oxidation of the film as derived from a deconvolution of the spectral features and the charge as determined from coulometric analysis of the voltammetric curves. This observation suggests that only two Ru-based redox states are involved in this electrochemical process.

本文言語English
ページ(範囲)12373-12375
ページ数3
ジャーナルJournal of Physical Chemistry B
106
48
DOI
出版ステータスPublished - 2002 12月 5
外部発表はい

ASJC Scopus subject areas

  • 物理化学および理論化学
  • 表面、皮膜および薄膜
  • 材料化学

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