Increase of the resistivity of electroless-deposited high-Bs CoNiFeB thin films

Masataka Sobue, Takayuki Segawa, Tokihiko Yokoshima, Tetsuya Osaka, Daiju Kaneko, Atsushi Tanaka

研究成果: Conference article査読

7 被引用数 (Scopus)

抄録

In order to increase the resistivity of electroless-deposited high-Bs CoNiFeB thin films, it was decided to investigate the effect of adding a β-alanine containing complexing agent to the plating bath. The resistivity (ρ) gradually increased as the β-alanine concentration was increased. CoNiFeB thin films with desirable soft magnetic properties, Bs = 17-17.5 kG and Hc < 3.0 Oe, were obtained under these conditions with ρ value (70-90 μΩ cm) dependant on carbon incorporation in the films. It has been suggested that carbon impurities in the films resulting from the use of the β-alanine complexing agent containing -NH2 group causes electron scattering, leading to an increase in the resistivity.

本文言語English
ページ(範囲)2228-2230
ページ数3
ジャーナルIEEE Transactions on Magnetics
38
5 I
DOI
出版ステータスPublished - 2002 9
イベント2002 International Magnetics Conference (Intermag 2002) - Amsterdam, Netherlands
継続期間: 2002 4 282002 5 2

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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