Increased rate of ozone adsorption on Si(111)-(7 × 7) with nitrogen preadsorption

Ken Nakamura, Akira Kurokawa, Shingo Ichimura

研究成果: Article査読

3 被引用数 (Scopus)

抄録

We observed by surface second harmonic generation (SHG) that initial the rate of second harmonics (SH) intensity decay during ozone adsorption on nitrogen-preadsorbed Si(111) was four times faster than on clean Si(111)-(7 × 7) because of the adsorption not only of atomic oxygen but also of oxygen molecules released by the dissociation of incident ozone molecules. The temperature dependence of the adsorption rate on nitrogen-adsorbed Si(111) was opposite to that on the clean Si(11)-(7 × 7) surface, but similar to that of molecular oxygen on Si(11)-(7 × 7). With increasing surface temperature, the sticking probability lessened in a similar way to that of molecular oxygen. This suggests that the sticking probability of molecular oxygen released by dissociating ozone molecules increases on nitrogen-adsorbed Si(111).

本文言語English
ページ(範囲)165-169
ページ数5
ジャーナルSurface Science
402-404
DOI
出版ステータスPublished - 1998 5 15
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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