Indium oxide-based transparent conductive films deposited by reactive sputtering using alloy targets

Yusuke Miyazaki, Eri Maruyama, Junjun Jia, Hironobu MacHinaga, Yuzo Shigesato

研究成果: Article査読

2 被引用数 (Scopus)

抄録

High-quality transparent conductive oxide (TCO) films, Sn-doped In2O3 (ITO) and In2O3-ZnO (IZO), were successfully deposited on either synthetic silica or polyethylene terephthalate (PET) substrates in the "transition region" by reactive dc magnetron sputtering using In-Zn and In-Sn alloy targets, respectively, with a specially designed plasma emission feedback system. The composition, crystallinity, surface morphology, and electrical and optical properties of the films were analyzed. All of the IZO films were amorphous, whereas the ITO films were polycrystalline over a wide range of deposition conditions. The minimum resistivities of the IZO and ITO films deposited on the heated PET substrates at 150 °C were 3.3 ×10-4 and 5.4 ×10-4Ωcm, respectively. By applying rf bias to unheated PET substrates, ITO films with a resistivity of 4.4 ×10-4Ωcm were deposited at a dc self-bias voltage of -60 V.

本文言語English
論文番号045503
ジャーナルJapanese journal of applied physics
56
4
DOI
出版ステータスPublished - 2017
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

フィンガープリント 「Indium oxide-based transparent conductive films deposited by reactive sputtering using alloy targets」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル