Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

T. Q. Li, S. Noda, Y. Tsuji, T. Ohsawa, H. Komiyama

研究成果: Article査読

76 被引用数 (Scopus)

抄録

The initial growth and texture formation mechanism of TiN films were studied by using TEM and XRD. In the early stages of TiN deposition, randomly oriented nuclei were observed in a continuous TiN layer. TiN exhibited (111)-preferred orientation under relatively low N2 partial pressure and (200)-preferred orientation under relatively high N2 partial pressure.

本文言語English
ページ(範囲)583-588
ページ数6
ジャーナルJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
20
3
DOI
出版ステータスPublished - 2002
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

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