Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

Xue Dong Liu*, Hiroshi Funakubo, Suguru Noda, Hiroshi Komiyama

*この研究の対応する著者

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400 °C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behavior of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

本文言語English
ページ(範囲)253-259
ページ数7
ジャーナルChemical Vapor Deposition
7
6
DOI
出版ステータスPublished - 2001 11 1
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 表面および界面
  • プロセス化学およびプロセス工学

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