Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

X. D. Liu*, H. Funakubo, S. Noda, H. Komiyama

*この研究の対応する著者

研究成果: Article査読

抄録

Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400°C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behaviour of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

本文言語English
ページ(範囲)253-259
ページ数7
ジャーナルAdvanced Materials
13
21
出版ステータスPublished - 2001 11月 2
外部発表はい

ASJC Scopus subject areas

  • 材料科学(全般)
  • 材料力学
  • 機械工学

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