Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

X. D. Liu; H. Funakubo; S. Noda; H. Komiyama

Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

X. D. Liu^*, H. Funakubo, S. Noda, H. Komiyama

^*この研究の対応する著者

研究成果: Article › 査読

抄録

Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO₂/Si substrate at 400°C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behaviour of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

本文言語	English
ページ（範囲）	253-259
ページ数	7
ジャーナル	Advanced Materials
巻	13
号	21
出版ステータス	Published - 2001 11月 2
外部発表	はい

ASJC Scopus subject areas

材料科学（全般）
材料力学
機械工学

他のファイルとリンク

引用スタイル

@article{a943c2dc8aec401abce17bf3db3d63e6,

title = "Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD",

abstract = "Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400°C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behaviour of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.",

keywords = "Formation mechanisms, Lead, MOCVD, Modelling, Niobium, Titanium, Two-dimensional vector analysis",

author = "Liu, {X. D.} and H. Funakubo and S. Noda and H. Komiyama",

year = "2001",

month = nov,

day = "2",

language = "English",

volume = "13",

pages = "253--259",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag",

number = "21",

}

TY - JOUR

T1 - Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

AU - Liu, X. D.

AU - Funakubo, H.

AU - Noda, S.

AU - Komiyama, H.

PY - 2001/11/2

Y1 - 2001/11/2

N2 - Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400°C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behaviour of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

AB - Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400°C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behaviour of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

KW - Formation mechanisms

KW - Lead

KW - MOCVD

KW - Modelling

KW - Niobium

KW - Titanium

KW - Two-dimensional vector analysis

UR - http://www.scopus.com/inward/record.url?scp=0035798426&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035798426&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0035798426

VL - 13

SP - 253

EP - 259

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 21

ER -

Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

抄録

ASJC Scopus subject areas

他のファイルとリンク

フィンガープリント

引用スタイル