Joule heating induced local electrodeposition for microelectronic circuits

Hiroyuki Kawamoto*

*この研究の対応する著者

研究成果査読

3 被引用数 (Scopus)

抄録

A fundamental study is performed for local electrodeposition of copper utilizing thermal potential induced by Joule heating. The feasibility of the process for microelectronic applications is assessed by both experiment and mathematical modeling. The results of the investigation show that (i) a copper wire is coated under conditions of a.c. 50 Hz Joule heating in electrolyte containing 1.0 M CuSO4 and 0.5 m H2SO4 with relatively high deposition rate of about 0.4 μm min-1, (ii) the Joule heating current should be kept below the boiling point of the solution to realize uniform deposition, and (iii) results of calculations by the present model based on one-dimensional heat conduction agree well with experimental results.

本文言語English
ページ(範囲)435-442
ページ数8
ジャーナルJournal of Applied Electrochemistry
23
5
DOI
出版ステータスPublished - 1993 5
外部発表はい

ASJC Scopus subject areas

  • 電気化学

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