Large area chemical vapour deposition of diamond particles and films using magneto-microwave plasma

Hiroshi Kawarada, King Sheng, Akio Hiraki

研究成果: Article査読

105 被引用数 (Scopus)

抄録

Large area chemical vapour deposition of diamond has been obtained using magneto-microwave plasma. The important point of the developed system is to set the electron cyclotron resonance condition (875 G), where the highest plasma density is expected, at the deposition area by controlling the distribution of an applied magnetic field. Even in 10 Torr where complete electron gyrations cannot be expected, the size of the discharge area controlled by the magnetic field is 70-80 mm in diameter. This value is the largest of all plasma deposition systems of diamond. The crystallinity obtained by the above-mentioned plasma compares favourably with those of the best ones by previous methods.

本文言語English
ページ(範囲)1032-1034
ページ数3
ジャーナルJapanese journal of applied physics
26
6A
DOI
出版ステータスPublished - 1987 6
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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