LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY UTILIZING THE STEERING OF THE ELECTRON BEAM IN THE STORAGE RING.

Hiroshi Tanino, Koichiro Hoh, Masahiro Hirata, Shingo Ichimura, Nobufumi Atoda, Takio Tomimasu, Tsutomu Noguchi, Suguru Sugiyama, Tetsuo Yamazaki

研究成果: Article

4 引用 (Scopus)

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It is demonstrated that the vertical (normal to the plane of electron orbit) width of exposed region in synchrotron radiation lithography can be expanded by a factor of more than three by steering the electron beam in the storage ring with a horizontal magnetic field, without losing intensity and homogeneity. The vertical distribution of the developed thickness in the resist and its vertical shift with the steering magnetic field are evaluated. The perturbation in the electron orbit is also estimated from the shifts of soft X-rays and visible illuminated regions.

元の言語English
ページ(範囲)l677-l679
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
22
発行部数11
DOI
出版物ステータスPublished - 1983 1 1
外部発表Yes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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