Large area nano pattern fabrication using improved step and repeat UV nanoimprint

Continuous nano structures whose sizes 100 nm line and space were successfully fabricated using two step nanoimprint including oxygen (O ₂) plasma irradiation on a silicon substrate in 8 × 56 mm ² area. Silicon substrate surface condition is important property because fine and continuous pattern forming depend on photo curable resin uniform coating. O ₂ plasma irradiation is realized to change into hydrophilic without damage for silicon substrate. The water contact angle was decreased to smaller than 40° after O ₂ plasma irradiation. Therefore O ₂ plasma irradiation has an advantage of treatment process for continuous nanostructure forming. Our activities on UV nanoimprint lithography are expected to be progress for large area continuous nano structures fabrication.