TY - JOUR
T1 - Large area nano pattern fabrication using improved step and repeat UV nanoimprint
AU - Ishibashi, Kentaro
AU - Goto, Hiroshi
AU - Kasahara, Takashi
AU - Mizuno, Jun
AU - Shoji, Shuichi
PY - 2012
Y1 - 2012
N2 - Continuous nano structures whose sizes 100 nm line and space were successfully fabricated using two step nanoimprint including oxygen (O 2) plasma irradiation on a silicon substrate in 8 × 56 mm 2 area. Silicon substrate surface condition is important property because fine and continuous pattern forming depend on photo curable resin uniform coating. O 2 plasma irradiation is realized to change into hydrophilic without damage for silicon substrate. The water contact angle was decreased to smaller than 40° after O 2 plasma irradiation. Therefore O 2 plasma irradiation has an advantage of treatment process for continuous nanostructure forming. Our activities on UV nanoimprint lithography are expected to be progress for large area continuous nano structures fabrication.
AB - Continuous nano structures whose sizes 100 nm line and space were successfully fabricated using two step nanoimprint including oxygen (O 2) plasma irradiation on a silicon substrate in 8 × 56 mm 2 area. Silicon substrate surface condition is important property because fine and continuous pattern forming depend on photo curable resin uniform coating. O 2 plasma irradiation is realized to change into hydrophilic without damage for silicon substrate. The water contact angle was decreased to smaller than 40° after O 2 plasma irradiation. Therefore O 2 plasma irradiation has an advantage of treatment process for continuous nanostructure forming. Our activities on UV nanoimprint lithography are expected to be progress for large area continuous nano structures fabrication.
KW - Large area
KW - Nano pattern stitching
KW - O plasma irradiation
KW - UV Nanoimprint Lithography (UV-NIL)
UR - http://www.scopus.com/inward/record.url?scp=84865017128&partnerID=8YFLogxK
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U2 - 10.2494/photopolymer.25.235
DO - 10.2494/photopolymer.25.235
M3 - Article
AN - SCOPUS:84865017128
VL - 25
SP - 235
EP - 238
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 2
ER -