Low-glancing-angle x-ray diffraction study on the relationship between crystallinity and properties of C60 field effect transistor

Hirotaka Ohashi; Katsumi Tanigaki; Ryotaro Kumashiro; Syuji Sugihara; Nobuya Hiroshiba; Shigeru Kimura; Kenichi Kato; Masaki Takata

doi:10.1063/1.1638882

Low-glancing-angle x-ray diffraction study on the relationship between crystallinity and properties of C₆₀ field effect transistor

Hirotaka Ohashi^*, Katsumi Tanigaki, Ryotaro Kumashiro, Syuji Sugihara, Nobuya Hiroshiba, Shigeru Kimura, Kenichi Kato, Masaki Takata

^*この研究の対応する著者

研究成果: Article › 査読

23 被引用数 (Scopus)

抄録

The relationship between the structure of C₆₀ thin films and its field effect transistor (FET) properties was investigated. The low glancing angle x-ray diffraction method at a high energy beam facility was used for the study. It was observed that the FET characteristics consisting of C ₆₀ thin films on Si substrates showed little dependence on the structural differences under conventional growth conditions. The trapping levels produced due to the chemical and physical adsorption of oxygen and water were found to influence the FET characteristics.

本文言語	English
ページ（範囲）	520-522
ページ数	3
ジャーナル	Applied Physics Letters
巻	84
号	4
DOI	https://doi.org/10.1063/1.1638882
出版ステータス	Published - 2004 1月 26
外部発表	はい

ASJC Scopus subject areas

物理学および天文学（その他）

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10.1063/1.1638882

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引用スタイル

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AU - Kimura, Shigeru

AU - Kato, Kenichi

AU - Takata, Masaki

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