Low temperature direct bonding of single crystal quartz substrates for high performance optical low pass filter using amorphous SiO2 intermediate layers

Bo Ma*, Hiroyuki Kuwae, Akiko Okada, Weixin Fu, Shuichi Shoji, Jun Mizuno

*この研究の対応する著者

研究成果: Conference contribution

3 被引用数 (Scopus)

抄録

We proposed a HF-assisted single crystal quartz direct bonding method at low temperature using amorphous SiO2 layer for high performance optical low pass filter (OLPF) to improve heat resistance compared with conventional OLPFs using UV-curing adhesive. Amorphous SiO2 was deposited by ion beam sputtering on backside of both infrared reflection and anti-reflection coated substrates. By the etching rate evaluation, amorphous SiO2 deposition is considered to provide high active surface useful for bonding. The HF bonded sample with amorphous SiO2 layer achieved 0.8 MPa in tensile test and 3.3 MPa in shear test, and also nearly 100 % light transmittance was performed, which is as the same level as conventional UV-curing adhesive one. Therefore, the proposed single crystal quartz direct bonding with amorphous SiO2 layers is considered to be a promising technique to realize high performance OLPFs.

本文言語English
ホスト出版物のタイトルMEMS 2016 - 29th IEEE International Conference on Micro Electro Mechanical Systems
出版社Institute of Electrical and Electronics Engineers Inc.
ページ25-28
ページ数4
ISBN(電子版)9781509019731
DOI
出版ステータスPublished - 2016 2 26
イベント29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016 - Shanghai, China
継続期間: 2016 1 242016 1 28

出版物シリーズ

名前Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
2016-February
ISSN(印刷版)1084-6999

Other

Other29th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2016
国/地域China
CityShanghai
Period16/1/2416/1/28

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 機械工学
  • 電子工学および電気工学

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