Low Temperature Flip Chip Bonding Using Squeegee-Embedded Au Nanoporous Bump Activated by VUV/O3 Treatment

Weixin Fu, Tatsushi Kaneda, Akiko Okada, Kaori Matsunaga, Shuichi Shoji, Mikiko Saito, Hiroshi Nishikawa, Jun Mizuno*

*この研究の対応する著者

研究成果査読

1 被引用数 (Scopus)

抄録

This paper describes low-temperature bonding realized by squeegee-embedded Au nanoporous bumps that were activated by vacuum ultraviolet in the presence of oxygen (VUV/O3). The VUV/O3 technology is confirmed to be a suitable surface treatment technique for Au nanoporous bump bonding because it maintains the highly reactive surface of the Au nanoporous bumps during the treatment. X-ray photoelectron spectroscopy confirmed that the VUV/O3 treatment was capable of removing organic contamination on the nanoporous surface, and scanning electron microscopy images showed that the ligament size of the nanoporous bumps stayed the same. After bonding, the ligament size of the VUV/O3-treated nanoporous structure grew to 54 nm compared with 27 nm for the untreated samples. This increase in ligament size was attributed to the improvement in nanoporous coalescence by removing organic contamination that obstructed Au atom diffusion. Furthermore, the highest strength of the VUV/O3-treated samples reached 8.9 MPa at a low temperature of 200°C, which was three times higher than that of the untreated sample. This technology is expected to assist manufacturing of future 3-D integrations.

本文言語English
ページ(範囲)5952-5958
ページ数7
ジャーナルJournal of Electronic Materials
47
10
DOI
出版ステータスPublished - 2018 10 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 電子工学および電気工学
  • 材料化学

フィンガープリント

「Low Temperature Flip Chip Bonding Using Squeegee-Embedded Au Nanoporous Bump Activated by VUV/O<sub>3</sub> Treatment」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル