The use of atomic hydrogen for the low temperature treatment of ZnTe substrate surface was discussed. The hydrogen treatment at 100°C removed the surface oxide of the compound prior to its nucleation. The reconstructed surface was achieved at 230°C through annealing and the nucleation was also confirmed.
|ジャーナル||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|出版ステータス||Published - 2003 7月 1|
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