Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen

K. Tsutsumi, H. Terakado, M. Enami, M. Kobayashi

研究成果: Article査読

16 被引用数 (Scopus)

抄録

The use of atomic hydrogen for the low temperature treatment of ZnTe substrate surface was discussed. The hydrogen treatment at 100°C removed the surface oxide of the compound prior to its nucleation. The reconstructed surface was achieved at 230°C through annealing and the nucleation was also confirmed.

本文言語English
ページ(範囲)1959-1962
ページ数4
ジャーナルJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
21
4
出版ステータスPublished - 2003 7 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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