MASS- AND ELECTRON-SPECTROSCOPIC OBSERVATION OF RESIST DECOMPOSITION BY SYNCHROTRON RADIATION.

Shingo Ichimura*, Masahiro Hirata, Hiroshi Tanino, Nobufumi Atoda, Koichiro Hoh, Masatoshi Ono

*この研究の対応する著者

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Analytical techniques of mass- and electron-spectroscopy were applied to the observation of lithography by synchrotron radiation (SR). During the exposure of positive resist to SR, the tendency of side-chain components easily dissociating was shown by mass spectroscopy. In-situ analysis with electron spectroscopy showed that the height of a peak appearing at low energy increased during the exposure when the power density of SR was high. This increase was closely related to the reduction in the film thickness by SR due to the dissociation of constituent molecules of the resist.

本文言語English
ページ(範囲)406-408
ページ数3
ジャーナルJapanese Journal of Applied Physics, Part 2: Letters
22
7
DOI
出版ステータスPublished - 1983
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(その他)
  • 物理学および天文学(全般)

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