Measurement of outgassing characteristics from a vacuum chamber fabricated for pressure calibration in UHV/XHV region

Shingo Ichimura, Kiyohide Kokubun, Masahiro Hirata, Sonoko Tsukahara, Kzuya Saito, Yoshinao Ikeda

研究成果: Conference article査読

13 被引用数 (Scopus)

抄録

The construction of a new vacuum system fabricated for pressure calibration in UHV/XHV region is explained together with the measurement of outgassing rate from an XHV chamber used in the system. The outgassing rate was measured using a test chamber by a throughput method after each treatment of the chamber surface such as electrolytic polishing, pre-baking in vacuum, and TiN coating. It was found that the outgassing rate of 3.7 × 10-9 Pa m s-1 after electrolytical polishing could be reduced to 1.0 × 10-13 Pa m s-1 after pre-baking twice followed by TiN coating. The outgassing rate was also measured by the pressure rise method using the whole XHV chamber, and the result was compared with that obtained with the test chamber.

本文言語English
ページ(範囲)291-294
ページ数4
ジャーナルVacuum
53
1-2
DOI
出版ステータスPublished - 1999 5月
外部発表はい
イベントProceedings of the 1998 14th International Vaccum Congress 10th International Conference on Solid Surfaces 5th International Conference on Nanometre-Scale Science and Technology 10th International Conference on Quantitative Surface Analysis - Birmingham, GBR
継続期間: 1998 8月 311998 9月 4

ASJC Scopus subject areas

  • 器械工学
  • 凝縮系物理学
  • 表面、皮膜および薄膜

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