Membrane sieve using stoichiometric and stress-reduced SiN/SiO/SiN multilayer films and applications to plasma separation

Dae Sik Lee*, Yo Han Choi, Mun Yeon Jun, Yong Duk Han, Hyun C. Yoon, Shuichi Shoji

*この研究の対応する著者

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

We have proposed a stoichiometric and stress-reduced silicon nitride/silicon oxide/silicon nitride (N/O/N) triple-layer membrane sieves. The membrane sieves were designed to be ultra flat and thin, mechanically stress-reduced, and stable in their electrical and chemical properties. All insulating materials are deposited stoichiometrically by a low pressure chemical vapor deposition (LPCVD) system. The SiN/SiO/SiN membranes with a thickness of 0.4 mm have pores with diameters of 0.6-2 mm. The device is easily fabricated on a 6' silicon wafer with full compatibility with CMOS processes. To see the separation ability of blood plasma, an agarose gel matrix was attached to the sieves for improving the speed, which can be delayed by clogging. We could separate about 1 mL of plasma from 5 mL of human whole blood. We believes that our device can be applicable for the cell-based biosensors or analysis systems in analytical chemistry and bioseparation system.

本文言語English
ホスト出版物のタイトルIEEE SENSORS 2012 - Proceedings
DOI
出版ステータスPublished - 2012 12 1
イベント11th IEEE SENSORS 2012 Conference - Taipei, Taiwan, Province of China
継続期間: 2012 10 282012 10 31

出版物シリーズ

名前Proceedings of IEEE Sensors

Conference

Conference11th IEEE SENSORS 2012 Conference
国/地域Taiwan, Province of China
CityTaipei
Period12/10/2812/10/31

ASJC Scopus subject areas

  • 電子工学および電気工学

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