We developed an elastomer-based Fabry-Perot interferometer with a submicron gap between a freestanding thin film and a substrate by a dry transfer technique. A newly developed elastomeric nanosheet using a polystyrene-polybutadiene-polystyrene triblock copolymer (SBS) provides a low Young's modulus of 40 MPa, a large elastic strain of 38%, and high adhesiveness. A freestanding SBS nanosheet can be formed by a dry transfer technique without vacuum and high-temperature processes owing to the high adhesiveness of SBS nanosheets. With the pressure change, the freestanding nanosheet was found to deform with good adhesion between the dry transferred SBS and the substrate.
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