Metallic bismuth on strontium-bismuth tantalate thin films for ferroelectric memory application

Katsuhiko Asami, Tetsuya Osaka, Tomomi Yamanobe, Ichiro Koiwa

研究成果: Conference article査読

12 被引用数 (Scopus)

抄録

Strontium-bismuth tantalate (SBT) has been actively investigated as an attractive candidate for non-volatile ferroelectric random access memories because of its high resistance to fatigue. However, the ferroelectric property of SBT is easily affected by fabrication process parameters. The relationship between the surface chemistry of SBT thin films and the fabrication process parameters, such as crystallization temperature, upper Pt electrode, annealing in oxygen after Pt electrode fabrication (= the second annealing), hydrogen sintering and ion etching, were examined mainly by XPS analysis. In all specimens, metallic Bi, which is one of the main causes for deterioration of their performances, was observed in addition to oxidic Bi, Sr and Ta. The deposition of an upper Pt electrode resulted exclusively in an increase in metallic Bi content. Sintering in a hydrogen atmosphere and ion etching increased the ratio of metallic Bi to total Bi. The second annealing was effective in suppressing the metallic Bi content.

本文言語English
ページ(範囲)391-395
ページ数5
ジャーナルSurface and Interface Analysis
30
1
DOI
出版ステータスPublished - 2000 8 1
イベント8th European Conference on Applications of Surface and Interface Analisys, ECASIA 99 - Sevilla, Spain
継続期間: 1999 10 41999 10 8

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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