Micro- and nano-scale fabrication of fluorinated polymers by direct etching using focused ion beam

Naoyuki Fukutake*, Nozomi Miyoshi, Yuya Takasawa, Tatsuya Urakawa, Tomoko Gowa, Kazumasa Okamoto, Akihiro Oshima, Seiichi Tagawa, Masakazu Washioy

*この研究の対応する著者

研究成果: Article査読

9 被引用数 (Scopus)

抄録

Micro- and nano-scale fabrications of various fluorinated polymers were demonstrated by direct maskless etching using a focused ion beam (FIB). The etching rates of perfluorinated polymers, such as poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP), poly(tetrafluoroethylene-co-perfluoroalkoxyvinylether) (PFA), were about 500-1000 times higher than those of partially fluorinated polymers, such as poly(tetrafluoroethylene-co-ethylene) (ETFE) and poly(vinilydene-fluoride) (PVdF). Controlled high quality and high aspect-ratio nanostructures of spin-coated cross-linked PTFE were obtained without solid debris. The height and diameter of the fibers were about 1.5 μm and 90 nm, respectively. Their aspect ratio was about 17.

本文言語English
ページ(範囲)652011-652015
ページ数5
ジャーナルJapanese journal of applied physics
49
6 PART 1
DOI
出版ステータスPublished - 2010 6月

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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