Micro-/nanofabrication of cross-linked poly(L-lactic acid) using electron beam nanoimprint lithography

Satoshi Okubo*, Naotsugu Nagasawa, Akinobu Kobayashi, Tomoko Gowa Oyama, Mitsumasa Taguchi, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

*この研究の対応する著者

研究成果査読

3 被引用数 (Scopus)

抄録

Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(L-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/ TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 °C.

本文言語English
論文番号027303
ジャーナルApplied Physics Express
5
2
DOI
出版ステータスPublished - 2012 2

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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