Micro-photoluminescence study on defects induced by ion microbeam in silica glass

Masato Murai, Hiroyuki Nishikawa*, Tomoharu Nakamura, Hirohiko Aiba, Yoshimichi Ohki, Masakazu Oikawa, Takahiro Sato, Tomihiro Kamiya

*この研究の対応する著者

研究成果: Article査読

2 被引用数 (Scopus)

抄録

We have evaluated the irradiation effects by ion microbeam on silica glass for various ion species by means of a micro-photoluminescence technique. Defect generation and refractive index change were observed for silica at the area of 10 μm × 50 μm scanned by ion microbeam of H+, He+, N4+, C4+, O4+, and Si5+ with energy from 1.7 to 18 MeV. The μ-PL spectroscopy measurements were performed along the side surface perpendicular to the microbeam irradiated surface. Based on the comparison with a result of SRIM (stopping and range of ions in matter) simulation, the defect generation mechanism was discussed in terms of the energy deposition processes due to electronic and nuclear stopping powers. We conclude that the electronic stopping power is responsible for the defect generation at the track of ions. The effect of the nuclear stopping power is also not negligibly small at the end of range.

本文言語English
ページ(範囲)537-541
ページ数5
ジャーナルJournal of Non-Crystalline Solids
353
5-7
DOI
出版ステータスPublished - 2007 4 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • 凝縮系物理学
  • 材料化学

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