Microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching

T. Katoh, D. Yamaguchi, Y. Satoh, S. Ikeda, Y. Aoki, M. Washio, Y. Tabata

研究成果: Conference article査読

33 被引用数 (Scopus)

抄録

High aspect-ratio (more than 10) microfabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PTFE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of normal PTFE. The temperature dependence of the etching rates indicated that molecular motion of α-relaxation of samples and structures of smaller fragments (i.e., etched products) produced by irradiation of SR with high dose rate play an important role for SR direct photo-etching. Moreover, we have found that surface modification of PTFE had been proceeding during irradiation of SR to the PTFE at 140°C. The results of differential scanning calorimeter measurements for the modified layers showed that the layers might have crosslinking character.

本文言語English
ページ(範囲)24-28
ページ数5
ジャーナルApplied Surface Science
186
1-4
DOI
出版ステータスPublished - 2002 1 28
イベントProceedings of the European Materials Research Society 2001 Symposium - Strasbourg, France
継続期間: 2001 6 52001 6 5

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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