Microstructure of CoNiFeB electroless-deposited soft magnetic underlayer for perpendicular recording media

Y. K. Takahashi*, K. Hono, M. Ishii, S. Itoh, K. Ohashi

*この研究の対応する著者

研究成果: Article査読

3 被引用数 (Scopus)

抄録

The microstructure of a CoNiFeB film for a soft magnetic underlayer of perpendicular recording media, which was deposited by electroless plating on a Si wafer, has been investigated by transmission electron microscopy and a three-dimensional atom probe. After the deposition of the CoNiFeB film on a Ni underlayer, Hc decreased from about 62 to about 3 Oe. Based on the microstructure observation results, the decrease of Hc was concluded to be the result of reduced magneto-elastic energy. The good adhesiveness between the soft underlayer (SUL) and the Si substrate was found to be due to the composition gradient.

本文言語English
ページ(範囲)490-495
ページ数6
ジャーナルJournal of Magnetism and Magnetic Materials
320
3-4
DOI
出版ステータスPublished - 2008 2
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

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