抄録
We introduce a new type of microscopy which is capable of investigating surface topography and electrical property of conductive and dielectric materials simultaneously on a nanometer scale. The microwave atomic force microscopy is a combination of the principles of the scanning probe microscope and the microwave-measurement technique. As a result, under the noncontact AFM working conditions, we successfully generated a microwave image of a 200-nm Au film coating on a glass wafer substrate with a spatial resolution of 120 nm and a measured voltage difference of 19.2 mV between the two materials.
本文言語 | English |
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論文番号 | 123708 |
ジャーナル | Review of Scientific Instruments |
巻 | 81 |
号 | 12 |
DOI | |
出版ステータス | Published - 2010 12月 |
外部発表 | はい |
ASJC Scopus subject areas
- 器械工学