MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

ISAMU KATO, SHIN ICHI WAKANA, SHINJI HARA, HIROSHI KEZUKA

    研究成果: Chapter

    29 被引用数 (Scopus)

    抄録

    THIS STUDY WAS CONCERNED WITH THE DEVELOPMENT OF A PROCESS FOR THE DEPOSITION OF THIN-FILMS FROM A MICROWAVE PLASMA OF SEMICONDUCTOR MATERIALS. A COAXIAL LINE TYPE MICROWAVE CW DISCHARGE WAS USED TO CREATE UNIFORM PLASMAS, AND A-SI FILMS WERE FABRICATED FROM AR GAS CONTAINING 10PSIH//4. THE X-RAY DIFFRACTION PATTERNS SHOWED THAT THE FABRICATED FILMS, WHERE THE MICROWAVE POWER IS LARGE, ARE CRYSTALLIZED AND THE STRUCTURE OF THE OTHER FILMS IS AMORPHOUS. THE RESULTS ARE APPLICABLE TO SOLAR CELL MANUFACTURE.

    本文言語English
    ホスト出版物のタイトルJpn J Appl Phys Part 2
    ページ470-472
    ページ数3
    V 21
    N 8
    出版ステータスPublished - 1982 8

    ASJC Scopus subject areas

    • Engineering(all)

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