A new microwave-plasma sputtering method is described for the fabrication of thin solid films. One advantage of this method is that the substrate is not exposed to the plasma which can be made very uniform and confined in a predetermined region. It is, therefore, possible to fabricate uniform solid films over a large area and for a wide range of film thicknesses on low melting-point substrates. Amorphous selenium films fabricated on a glass substrate or a polyethylene sheet are found to be very uniform in thickness, structure, and optical constants over a large deposition area.
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