MOLECULAR BEAM EPITAXIAL GROWTH OF InP.

Sunichi Gonda, Yuichi Hirofuji, Yuichi Matsushima, Seiji Mukai

研究成果: Chapter

抜粋

Epitaxial growth of InP single crystal thin films on 100-direction-oriented GaAs was tried using the molecular beam deposition method. Stoichiometric InP films have been successfully grown at the growth rate of 50 or 100 A/min and at the substrate temperature T, of 200 similar 300 degree C under the condition of sufficient supply of P//2 beams. In particular, InP films growth at T//s congruent 240 degree C were evaluated to be the best by reflection high energy electron diffraction, scanning electron microscopy and electrical measurements. Epitaxial surfaces prepared by this method were several hundred times as smooth as those grown by liquid-phase or vapor-phase epitaxy, and by doping Sn into the InP films during molecular-beam epitaxy the surface morphology was greatly improved.

元の言語English
ホスト出版物のタイトルBull Electrotech Lab Tokyo
ページ709-717
ページ数9
40
エディション8
出版物ステータスPublished - 1976
外部発表Yes

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ASJC Scopus subject areas

  • Engineering(all)

これを引用

Gonda, S., Hirofuji, Y., Matsushima, Y., & Mukai, S. (1976). MOLECULAR BEAM EPITAXIAL GROWTH OF InP.Bull Electrotech Lab Tokyo (8 版, 巻 40, pp. 709-717)