Monitoring thermally induced cylindrical microphase separation of polystyrene-block-poly(Methyl methacrylate) by atomic force microscopy

Nobuya Hiroshiba, Ryo Okubo, Azusa N. Hattori, Hidekazu Tanaka, Masaru Nakagawa

研究成果: Article査読

抄録

Thermally induced growth of cylindrical microphase separation was observed for polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films on native oxide silicon substrates unmodified and modified with hydroxy-terminated polystyrene (PS-OH) by atomic force microscopy in dynamic force mode. The degrees of long-range order of the cylindrical microphase separation structures were investigated using the correlation length values. The correlation length became constant over 30 seconds regardless of the kind of substrates, while the PS-OH modified substrate caused a longer correlation length and a shorter closely packed periodicity in the cylindrical microphase separation than the bare silicon substrate did.

本文言語English
ページ(範囲)659-665
ページ数7
ジャーナルJournal of Photopolymer Science and Technology
29
5
DOI
出版ステータスPublished - 2016 1月 1
外部発表はい

ASJC Scopus subject areas

  • ポリマーおよびプラスチック
  • 有機化学
  • 材料化学

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