TY - JOUR
T1 - Nano- and bulk-tack adhesive properties of stimuli-responsive, fullerene-polymer blends, containing polystyrene-block-polybutadiene-block-polystyrene and polystyrene-block-polyisoprene-block-polystyrene rubber-based adhesives
AU - Phillips, J. Paige
AU - Deng, Xiao
AU - Stephen, Ryan R.
AU - Fortenberry, Erin L.
AU - Todd, Meredith L.
AU - McClusky, D. Michelle
AU - Stevenson, Steven
AU - Misra, Rahul
AU - Morgan, Sarah
AU - Long, Timothy Edward
PY - 2007/11/2
Y1 - 2007/11/2
N2 - Nano-tack (measured using AFM) and bulk-tack adhesive forces of blends of C
60 and either polystyrene-block-polybutadiene-block-polystyrene (SBS) or polystyrene-block-polyisoprene-block-polystyrene (SIS) triblock copolymer pressure sensitive adhesives were measured after exposure to white light irradiation. The nano-tack adhesive forces in C
60-SIS/SBS were found to decrease with increasing C
60 concentration and exposure time, approaching the value for 100% polystyrene, providing an indication that significant surface hardening and crosslinking of the soft isoprene and butadiene phases occurs in the presence of C
60. Films produced during the study were smooth, having low RMS surface roughness, and showed nanoscale phase separation between the soft (diene) and hard (styrene) segments. This phase separation disappeared after addition of C
60 sensitizer and white light irradiation. Bulk adhesive measurements (tack and peel strength) showed a similar trend with C
60 concentration and exposure time, and in irradiated systems containing as little as 0.2 wt% C
60, a significant decrease in adhesion was observed. Estimated T
g (measured using DMA, shear mode) of the soft-block shifts to higher temperatures (increasing by 30-40 °C), and high gel fractions were obtained, indicating the presence of chemically crosslinked networks.
AB - Nano-tack (measured using AFM) and bulk-tack adhesive forces of blends of C
60 and either polystyrene-block-polybutadiene-block-polystyrene (SBS) or polystyrene-block-polyisoprene-block-polystyrene (SIS) triblock copolymer pressure sensitive adhesives were measured after exposure to white light irradiation. The nano-tack adhesive forces in C
60-SIS/SBS were found to decrease with increasing C
60 concentration and exposure time, approaching the value for 100% polystyrene, providing an indication that significant surface hardening and crosslinking of the soft isoprene and butadiene phases occurs in the presence of C
60. Films produced during the study were smooth, having low RMS surface roughness, and showed nanoscale phase separation between the soft (diene) and hard (styrene) segments. This phase separation disappeared after addition of C
60 sensitizer and white light irradiation. Bulk adhesive measurements (tack and peel strength) showed a similar trend with C
60 concentration and exposure time, and in irradiated systems containing as little as 0.2 wt% C
60, a significant decrease in adhesion was observed. Estimated T
g (measured using DMA, shear mode) of the soft-block shifts to higher temperatures (increasing by 30-40 °C), and high gel fractions were obtained, indicating the presence of chemically crosslinked networks.
KW - Fullerene
KW - Photochemistry
KW - Pressure sensitive adhesive
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U2 - 10.1016/j.polymer.2007.08.050
DO - 10.1016/j.polymer.2007.08.050
M3 - Article
AN - SCOPUS:35348940150
VL - 48
SP - 6773
EP - 6781
JO - Polymer (United Kingdom)
JF - Polymer (United Kingdom)
SN - 0032-3861
IS - 23
ER -