Nano- and micro-fabrication of perfluorinated polymers using quantum beam technology

Nozomi Miyoshi, Akihiro Oshima, Tatsuya Urakawa, Naoyuki Fukutake, Hiroyuki Nagai, Tomoko Gowa, Yuya Takasawa, Tomohiro Takahashi, Yukari Numata, Takanori Katoh, Etsuko Katoh, Seiichi Tagawa, Masakazu Washio*

*この研究の対応する著者

研究成果: Article査読

12 被引用数 (Scopus)

抄録

Micro- and nano-fabrication researches of various perfluorinated polymers carried out recently both by synchrotron radiation (SR) direct photo-etching and by focused ion beam (FIB) direct mask less etching are reviewed. After the irradiation, the etching depth of the fabricated samples has been evaluated by optical microscope and scanning electron microscope. SR-induced surface modifications were studied by solid-state 19F nuclear magnetic resonance (NMR) spectroscopy and differential scanning calorimeter (DSC) analysis. It was found that the etching rate of FEP at 140°C was highest and that of PTFE and PFA at 140°C was lower in the SR etching. It was found that crosslinking reactions were induced by SR irradiation at the region within about 50γm from the irradiated surface. FIB mask less etching showed very attractive features for nano-scale fabrications. The aspect ratio for crosslinked PTFE (RX-PTFE) reached 390. In addition, the nano-scale controlled structures with high aspect and quality of RX-PTFE were obtained without solid debris.

本文言語English
ページ(範囲)230-235
ページ数6
ジャーナルRadiation Physics and Chemistry
80
2
DOI
出版ステータスPublished - 2011 2月

ASJC Scopus subject areas

  • 放射線

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