Nano- and micro-fabrications of polystyrene having atactic and syndiotactic structures using focused ion beams lithography

Akihiro Oshima*, Satoshi Okubo, Tomoko Gowa Oyama, Masakazu Washio, Seiichi Tagawa

*この研究の対応する著者

研究成果: Article査読

7 被引用数 (Scopus)

抄録

Micro- and nano-fabrications of polystyrene (PS) having the atactic and syndiotactic structures were carried out with direct maskless etching using focused ion beam (FIB). Micro- and nano-scale structures were obtained with selective beam and material conditions avoiding the beam-heating and charge-up effects. The etching rates were different between atactic and syndiotactic PS. The rate of fabrication for syndiotactic PS shows higher than that of atactic one. Moreover, the direct etching was influenced by the molecular weight. The etching rate for the lower molecular weight became the faster. The FIB direct etching proceeds through the two steps (decomposition and desorption (outgas)). Both decomposition and desorption are influenced by both conformation (morphology) and configuration (stereoregularity). Furthermore, the beam profiles and fluence play the important roles to perform the nano-fabrication of PS.

本文言語English
ページ(範囲)584-588
ページ数5
ジャーナルRadiation Physics and Chemistry
81
5
DOI
出版ステータスPublished - 2012 5月

ASJC Scopus subject areas

  • 放射線

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