Nanopatterning of hydroxy-terminated self-assembled monolayer taking advantage of terminal group modification

Takeo Miyake*, Takashi Tanii, Koichi Kato, Takumi Hosaka, Yuzo Kanari, Hironori Sonobe, Iwao Ohdomari

*この研究の対応する著者

研究成果: Article査読

10 被引用数 (Scopus)

抄録

The feasibility of using an octenyltrimethoxysilane (OCS) self-assembled monolayer (SAM) as a high-resolution electron beam (EB) resist is investigated. The vinyl groups of the OCS SAM can be modified into hydroxy groups, which are useful for biochip fabrication. The hydroxy-modified OCS SAM exhibits higher sensitivity than a vinyl-terminated one. By using the hydroxy-modified OCS SAM as an EB resist, a miniaturized pattern of 18 nm is achieved. Since the hydroxy-modified OCS SAM is repellent to many proteins, this methodology can be useful for the fabrication of protein-immobilizing templates of a molecular scale.

本文言語English
ページ(範囲)361-364
ページ数4
ジャーナルChemical Physics Letters
426
4-6
DOI
出版ステータスPublished - 2006 8月 4

ASJC Scopus subject areas

  • 物理学および天文学(全般)
  • 物理化学および理論化学

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