Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors

Makoto Fujimaki, Carsten Rockstuhl, Xiaomin Wang, Koichi Awazu, Junji Tominaga, Takahiro Ikeda, Yoshimichi Ohki, Tetsuro Komatsubara

研究成果: Article

16 引用 (Scopus)

抜粋

Swift heavy ion irradiation of dielectric materials forms latent tracks and selective etching of them results in the formation of well defined nanopores in the material. Irradiation of Au ions accelerated with 137 MeV followed by etching with vapor of hydrofluoric acid successfully formed nanopores with diameter of 30 nm and depth of 400 nm in a waveguide made of amorphous SiO2. In the present research, the nanopores were applied to improve sensitivity of an evanescent-field-coupled waveguide mode sensor that detects adsorption and/or adhesion of molecules at the surface of the waveguide and in the nanopores. Increase in the sensitivity was confirmed by examining the shift in the angular position necessary to excite the waveguide mode before and after adsorption of streptavidin to biotinyl groups.

元の言語English
ページ(範囲)1685-1689
ページ数5
ジャーナルMicroelectronic Engineering
84
発行部数5-8
DOI
出版物ステータスPublished - 2007 5

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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  • これを引用

    Fujimaki, M., Rockstuhl, C., Wang, X., Awazu, K., Tominaga, J., Ikeda, T., Ohki, Y., & Komatsubara, T. (2007). Nanoscale pore fabrication for high sensitivity waveguide-mode biosensors. Microelectronic Engineering, 84(5-8), 1685-1689. https://doi.org/10.1016/j.mee.2007.01.264