Nanovoid formation through the annealing of amorphous Al2O 3 and WO3 films

R. Nakamura, T. Shudo, A. Hirata, M. Ishimaru, H. Nakajima

研究成果: Article

16 引用 (Scopus)

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A high density of nanovoids between 2 and 13 nm in size was produced during the crystallization process when amorphous Al2O3 and WO3, which are 20-30% lower in density than their crystalline phases, were annealed. By contrast, no formation or growth of nanovoids was observed during the crystallization of amorphous TiO2, which has a density 2% lower than its crystalline phase. These results suggest that large differences in density between amorphous and crystalline oxides can be utilized to produce nanoporous structures.

元の言語English
ページ(範囲)197-200
ページ数4
ジャーナルScripta Materialia
64
発行部数2
DOI
出版物ステータスPublished - 2011 1
外部発表Yes

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys

フィンガープリント Nanovoid formation through the annealing of amorphous Al<sub>2</sub>O <sub>3</sub> and WO<sub>3</sub> films' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

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