NEXAFS and XPS studies of VUV/O3 treated aromatic polyurea for high-speed electrophoresis microchips

H. Shinohara, A. Nakahara, S. Shoji, J. Mizuno, Y. Takahashi, F. Kitagawa, K. Otsuka, O. Ohara

研究成果: Conference contribution

抄録

This research studies on VUV/O3-treated aromatic polyurea film from near-edge X-ray absorption fine structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS) spectra. These spectra indicate that the benzene ring was cleaved after the treatment, and carboxyl and hydroxyl groups were formed at the cleaved sites. The VUV/O3-treated polyurea was applied to polymethylmethacrylate (PMMA) microchip for microchip electrophoresis (MCE) of bovine serum albumin (BSA). Fast electroosmotic mobility of 4.6×10 4 cm2V-1s-1 was realized as well as reduction of the BSA adhesion. This functional surface is useful for high speed MCE analysis.

本文言語English
ホスト出版物のタイトルNEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems
ページ1267-1271
ページ数5
DOI
出版ステータスPublished - 2011 10 4
イベント6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011 - Kaohsiung, Taiwan, Province of China
継続期間: 2011 2 202011 2 23

出版物シリーズ

名前NEMS 2011 - 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems

Conference

Conference6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2011
CountryTaiwan, Province of China
CityKaohsiung
Period11/2/2011/2/23

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

フィンガープリント 「NEXAFS and XPS studies of VUV/O<sub>3</sub> treated aromatic polyurea for high-speed electrophoresis microchips」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル