抄録
Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.
本文言語 | English |
---|---|
ページ(範囲) | 153-156 |
ページ数 | 4 |
ジャーナル | Journal of Sol-Gel Science and Technology |
巻 | 2 |
号 | 1-3 |
DOI | |
出版ステータス | Published - 1994 1月 1 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- セラミックおよび複合材料
- 化学 (全般)
- 生体材料
- 凝縮系物理学
- 材料化学