Numerical analysis of oxygen transport in alpha titanium during isothermal oxidation

T. Kitashima, L. J. Liu, H. Murakami

研究成果: Article査読

16 被引用数 (Scopus)

抄録

Oxygen dissolution in titanium during oxidation is simulated with oxide/metal interface migration using a finite volume method. In this simulation, the oxidation rate resulting from both oxide growth and oxygen penetration into a metal are taken into account. The results show the temperature dependency of oxygen concentration at the oxide/metal interface in the metal, which is about 21 at% up to 600°C, and increases drastically to the oxygen solubility limit at temperatures above 600°C. This suggests that high stress due to the oxygen penetration may develop in the metal near the interface. This stress distribution could be dependent on temperature according to the relation between oxygen content and lattice parameters.

本文言語English
ページ(範囲)C441-C444
ジャーナルJournal of the Electrochemical Society
160
9
DOI
出版ステータスPublished - 2013 8 20
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

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