Observation of electron beam damage in thin-film SiO2 on Si with scanning Auger electron microscope

S. Ichimura, R. Shimizu

研究成果: Article査読

26 被引用数 (Scopus)

抄録

Electron beam damage to thin-film SiO2 was observed with a scanning Auger electron microscope. After a certain degree of electron beam exposure, changes in both the surface topography and chemical composition were investigated. The result suggested that there is a close relationship between the beam damage and the dissipation of incident energy in thin-film SiO 2.

本文言語English
ページ(範囲)6020-6022
ページ数3
ジャーナルJournal of Applied Physics
50
9
DOI
出版ステータスPublished - 1979 12 1
外部発表はい

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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